The Model IBS/e is a high vacuum thin film deposition system designed to precisely deposit sub-nanometer grain,
conductive coatings onto specimens prior to examination in the electron microscope. Thin, conductive films are
deposited onto specimens to prevent charging effects and to enhance contrast. Thin films are deposited using two
ion beam sources directed at a target material, eliminating radiation or heating effects common with other coating
techniques. Extremely thin, continuous metal or carbon films are deposited without risking damage to delicate
features present on the specimen. Virtually any target material can be used for ion beam deposition with precise
control over the deposition thickness. An optional third ion source allows specialized ion beam etching techniques to
be employed. The ability to deposit amorphous, continuous films makes the IBS/e system ideal for high resolution
electron microscopy techniques.
[Read brochure...] [Click Link to see Standard IBS/e Configurations with images]